45 nm design rule in-die overlay metrology on immersion lithography processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 2, 2007, Pages

  Shih, Yu Hao ^a   Huang, George K C ^a   Yu, Chun Chi ^a   Adel, Mike ^b   Huang, Chin Chou Kevin ^b   Izikson, Pavel ^b   Kassel, Elyakim ^b   Mathur, Sameer ^b   Huang, Chien Jen ^b   Tien, David ^b   Avrahamov, Yosef ^b  

^a UNITED MICROELECTRONICS CORPORATION   (Taiwan)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

In field; Metrology; Overlay; Process control; Residuals

Indexed keywords

DATA REDUCTION; MATHEMATICAL MODELS; PROCESS CONTROL; PRODUCTION CONTROL;

IMMERSION LITHOGRAPHY; PITCH PATTERNING; PRODUCTION MONITORING;

LITHOGRAPHY;

EID: 35148844324     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711754     Document Type: Conference Paper

References (7)

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