OPC model separability speeds computational lithography

Solid State Technology

Volumn 51, Issue 4, 2008, Pages

  Liu, Hua Yu ^a   Jiang, Jiong ^a   Zhao, Qian ^a   Chen, J Fung ^a   Socha, Robert ^a   Finders, Jo ^b  

^a ASML US Inc   (United States)

^b ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; EXTRAPOLATION; FINITE ELEMENT METHOD; MATHEMATICAL MODELS; PROXIMITY SENSORS;

COMPUTATIONAL LITHOGRAPHY; OPC MODEL SEPARABILITY; OPTICAL PROXIMITY CORRECTION (OPC); WAFER PRINTING;

PHOTOLITHOGRAPHY;

EID: 43249099484     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

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