Highly accurate model based verification using SEM image calibration method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Cho, Byung Ug ^a   Park, Dae Jin ^a   Chang, Dong Suk ^a   Choi, Jae Seung ^a   Kim, Cheol Kyun ^a   Yim, DongGyu ^a   Kim, Ju Byung ^b  

^a Hynix Semiconductor Inc   (South Korea)

^b Brion Technologies   (United States)

Author keywords

Model based verification; SEM image calibration method

Indexed keywords

CALIBRATION; DATA PROCESSING; FEEDBACK; INFORMATION ANALYSIS; MATHEMATICAL MODELS; SCANNING ELECTRON MICROSCOPY;

CD-BASED OPC MODELING; DATA FEEDBACK; IMAGE CALIBRATION METHOD; MASK ERROR ENHANCEMENT FACTOR; SEM IMAGE QUALITY;

IMAGE CLASSIFICATION;

EID: 35148865202     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712037     Document Type: Conference Paper

References (1)

1. James A. Bruce, Edward W. Conrad "Model-Based Verification for First Time Right Manufacturing", SPIE Vol. 5756, p 198 (2005)