Growth of SiOx nanowires by laser ablation

Nanotechnology

Volumn 19, Issue 6, 2008, Pages

  Aharonovich, Igor ^a   Tamir, Shoshana ^b   Lifshitz, Yeshayahu ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b Technion Research and Development Foundation   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH (MATERIALS); LASER ABLATION; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON DISPERSIVE SPECTROSCOPY (EDS); SUBSTRATE TEMPERATURE;

NANOWIRES;

NANOCOMPOSITE; NANOWIRE; SILICON;

ADSORPTION; ARTICLE; CATALYST; LASER SURGERY; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 43049135184     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/6/065608     Document Type: Article

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