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Volumn , Issue 9, 2006, Pages

The effect of annealing temperature on the statistical properties of WO3 surface

Author keywords

Stochastic processes (experiment); Stochastic processes (theory); Thin film deposition (experiment); Thin film deposition (theory)

Indexed keywords


EID: 42749102460     PISSN: 17425468     EISSN: 17425468     Source Type: Journal    
DOI: 10.1088/1742-5468/2006/09/P09017     Document Type: Article
Times cited : (31)

References (37)
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    • Krug J 1997 Adv. Phys. 46 139
    • (1997) Adv. Phys. , vol.46 , Issue.2 , pp. 139
    • Krug, J.1
  • 26
    • 0033722188 scopus 로고    scopus 로고
    • Kardar M 2000 Physica A 281 295
    • (2000) Physica , vol.281 , Issue.1-4 , pp. 295
    • Kardar, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.