Parameters and equilibrium profiles for large-area surface-wave sustained plasmas

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 65, Issue 4, 2002, Pages

  Denysenko, I B ^a   Gapon, A V ^a   Azarenkov, N A ^a   Ostrikov, K N ^b,c,d,e,f   Yu, M Y ^e  

^a V N KARAZIN KHARKIV NATIONAL UNIVERSITY   (Ukraine)

^b NAGOYA UNIVERSITY   (Japan)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d FLINDERS UNIVERSITY   (Australia)

^e RUHR UNIVERSITY BOCHUM   (Germany)

^f NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TEMPERATURE; LANGMUIR FREQUENCY; LARGE ASPECT RATIO (LAR); PLASMA DIFFUSION;

ATMOSPHERIC PRESSURE; BESSEL FUNCTIONS; BOUNDARY CONDITIONS; COMPUTER SIMULATION; DIELECTRIC MATERIALS; ELECTROMAGNETIC WAVES; IONIZATION; PLASMAS; SEMICONDUCTOR MATERIALS; SURFACE PHENOMENA;

SURFACE WAVES;

EID: 37649032458     PISSN: 15393755     EISSN: 15502376     Source Type: Journal    
DOI: 10.1103/PhysRevE.65.046419     Document Type: Article

References (45)

1. Plasma-Surface Interactions and Processing of Materials, edited by O. Auciello, A. Gras-Marti, J. A. Valles-Abarca, and D. L. Flamm (Kluwer Academic, Boston, 1990).
2. Advanced Technologies Based on Wave and Beam Generated Plasmas, NATO Advanced Studies Institute Partnership Sub-series 3, edited by H. Schlueter and A. Shivarova (Kluwer, Amsterdam, 1999).
3. Microwave Discharges: Fundamentals and Applications, Vol. 302 of NATO Advanced Studies Institute, Series B: Physics, edited by C. M. Ferreira and M. Moisan (Plenum, New York, 1993).
4. D. Korzec, F. Werner, R. Winter, and J. Engemann, Plasma Sources Sci. Technol. 5, 216 (1996).
5. G. Sauve, M. Moisan, R. Grenier, and Z. Zakrzewski, J. Microwave Power Electromagn. Energy 30, 58 (1995).
6. T. Ikushima, Y. Okuno, and H. Fujita, Appl. Phys. Lett. 64, 25 (1994).
7. H. Sugai, I. Ghanashev, and M. Nagatsu, Plasma Sources Sci. Technol. 7, 192 (1998).
8. S. Xu, K. N. Ostrikov, W. Luo, and S. Lee, J. Vac. Sci. Technol. A 18, 2185 (2000).
9. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
10. A. L. Vikharev, O. A. Ivanov, and A. L. Kolisko, Tech. Phys. Lett. 22, 832 (1996).
11. I. Zhelyazkov and V. Atanassov, Phys. Rep. 255, 79 (1995).
12. C. M. Ferreira, J. Phys. D 14, 1811 (1981).
13. I. Peres, M. Fortin, and J. Margot, Phys. Plasmas 3, 1754 (1996).
14. L. St-Onge, J. Margot, and M. Chaker, Plasma Sources Sci. Technol. 7, 154 (1998).
15. V. Viel, J. Bernard, and G. Laval, J. Phys. D 29, 1500 (1996).
16. G. DiPeso, T. D. Rognlien, V. Vahedi, and D. Hewett, IEEE Trans. Plasma Sci. 23, 550 (1995).
17. E. L. Tsakadze, K. N. Ostrikov, S. Xu, I. R. Jones, R. Storer, M. Y. Yu, and S. Lee, Phys. Rev. E 63, 046402 (2001); E. L. Tsakadze, K. N. Ostrikov, S. Xu, R. Storer, and H. Sugai, J. Appl. Phys. 91, 1804 (2002).
18. E. L. Tsakadze, K. N. Ostrikov, S. Xu, I. R. Jones, R. Storer, M. Y. Yu, and S. Lee, Phys. Rev. E 63, 046402 (2001); E. L. Tsakadze, K. N. Ostrikov, S. Xu, R. Storer, and H. Sugai, J. Appl. Phys. 91, 1804 (2002).
19. N. A. Azarenkov and K. N. Ostrikov, Phys. Rep. 308, 333 (1999).
20. V. E. Golant, A. P. Zhilinskii, and I. E. Sakharov, Fundamentals of Plasma Physics (Wiley, New York, 1980).
21. T. Petrova, E. Benova, G. Petrov, and I. Zhelyazkov, Phys. Rev. E 60, 875 (1999).
22. S. C. Brown, Introduction to Electrical Discharges in Gases (Wiley, New York, 1966).
23. Z. Zakrzewski, M. Moisan, V. M. M. Claude, C. Beudry, and P. Leprince, Plasma Phys. 19, 77 (1977).
24. S. Ashida, C. Lee, and M. A. Lieberman, J. Vac. Sci. Technol. A 13, 2498 (1995).
25. S. K. Godunov and V. S. Ryabenkii, Difference Schemes: An Introduction to Underlying Theory (North-Holland, Amsterdam, 1987).
26. H. M. Wu, B. W. Yu, A. Krishnan, M. Li, Y. Yang, J. P. Yan, and D. P. Yuan, IEEE Trans. Plasma Sci. 25, 776 (1997).
27. N. A. Azarenkov, I. B. Denysenko, A. V. Gapon, and T. W. Johnston, Phys. Plasmas 8, 1467 (2001).
28. F. Vidai, T. W. Johnston, J. Margot, M. Chaker, and O. Pauna, IEEE Trans. Plasma Sci. 27, 727 (1999).
29. Yu. M. Aliev, A. V. Maximov, U. Kortshagen, H. Schlueter, and A. Shivarova, Phys. Rev. E 51, 6091 (1995).
30. H. Sugai, I. Ghanashev, M. Hosokawa, K. Mizuno, K. Nakamura, H. Toyoda, and K. Yamauchi, Plasma Sources Sci. Technol. 10, 378 (2001).
31. J. Margot-Chaker, M. Moisan, M. Chaker, V. M. M. Claude, P. Lauque, J. Paraszczak, and G. Sauve, J. Appl. Phys. 66, 4134 (1989).
32. A. W. Trivelpiece and R. W. Gould, J. Appl. Phys. 30, 1784 (1959).
33. V. I. Kolobov and V. A. Godyak, IEEE Trans. Plasma Sci. 23, 503 (1995)
34. U. Kortshagen, C. Busch, and L. D. Tsendin, Plasma Sources Sci. Technol. 5, 1 (1996).
35. C. M. Ferreira and J. Loureiro, Plasma Sources Sci. Technol. 9, 528 (2000).
36. M. Shoucri, A. Cote, C. Cote, G. Pacher, P. Matte, A. Cardinali, and R. Spigler, Bull. Am. Phys. Soc. 46(8), 169 (2001).
37. R. A. Stewart, P. Vitello, D. B. Graves, E. F. Jaeger, and L. A. Berry, Plasma Sources Sci. Technol. 4, 36 (1995).
38. M. M. Turner, Phys. Rev. Lett. 71, 1844 (1993).
39. V. A. Godyak and V. I. Kolobov, Phys. Rev. Lett. 79, 4589 (1997).
40. N. A. Krall and A. W. Trivelpiece, Principles of Plasma Physics (Me Graw-Hill, New York, 1973).
41. L. M. Biberman, V. S. Vorob'ev, and I. T. Yakubov, Kinetics of Non-Equilibrium Low-Temperature Plasma (Nauka, Moscow, 1982), in Russian.
42. C. M. Ryu and M. Y. Yu, Phys. Scr. 57, 601 (1998).
43. K. N. Ostrikov, S. Xu, and A. B. M. Shafiul Azam, J. Vac. Sci. Technol. A 20, 251 (2002); A. B. M. Shafiul Azam, E. L. Tsakadze, Y. Li, K. N. Ostrikov, S. Xu, and S. Lee, Bull. Am. Phys. Soc. 45(7), 148 (2000).
44. K. N. Ostrikov, S. Xu, and A. B. M. Shafiul Azam, J. Vac. Sci. Technol. A 20, 251 (2002); A. B. M. Shafiul Azam, E. L. Tsakadze, Y. Li, K. N. Ostrikov, S. Xu, and S. Lee, Bull. Am. Phys. Soc. 45(7), 148 (2000).
45. A. N. Tikhonov and A. A. Samarskii, Partial Differential Equations of Mathematical Physics (Holden-Day, San Francisco, 1967).