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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2207-2216

Interfacial reaction pathways and kinetics during annealing of 111-textured Al/TiN bilayers: A synchrotron x-ray diffraction and transmission electron microscopy study

(6) Chun, J S a Desjardins, P a,b Lavoie, C c Petrov, I a Cabral Jr , C c Greene, J E a

a University of Illinois at Urbana Champaign (United States)

b ÉCOLE POLYTECHNIQUE DE MONTRÉAL (Canada)

c IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ALUMINUM; ANNEALING; CRYSTAL MICROSTRUCTURE; DIFFUSION; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; REACTION KINETICS; SPUTTER DEPOSITION; SURFACE CHEMISTRY; SURFACE REACTIONS; THERMAL EFFECTS; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

INTERFACIAL REACTION PATHWAYS;

MULTILAYERS;

EID: 0035440983 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1379800 Document Type: Article

Times cited : (13)

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