High resolution X-ray photoelectron spectroscopy of beta gallium oxide films deposited by ultra high vacuum radio frequency magnetron sputtering

Thin Solid Films

Volumn 516, Issue 14, 2008, Pages 4593-4597

  Takeuchi, Toshio ^a   Ishikawa, Hiroki ^a   Takeuchi, Norikazu ^a   Horikoshi, Yoshiji ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

Gallium oxide; High resolution XPS; Oxygen deficiency; UHV RF magnetron sputtering; Valence band structure

Indexed keywords

AMORPHOUS FILMS; MAGNESIA; MAGNETRON SPUTTERING; THIN FILMS; ULTRAHIGH VACUUM; VALENCE BANDS; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLINE SUBSTRATE; GALLIUM OXIDE; OXYGEN DEFICIENCY; RADIO FREQUENCY MAGNETRON SPUTTERING;

GALLIUM COMPOUNDS;

EID: 42649136616     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.075     Document Type: Article

References (21)

1. Bradley N.J., Cooper B.S., and Hobbs D.J. In: Cockayne B., and Jones D.W. (Eds). Modern Oxide Materials (1972), Academic Press, London and New York 288
2. Shur M.S., and Zukauskas A. In: Shur M.S., and Zukauskas A. (Eds). UV Solid-State Light Emitters and Detectors (2004), Kluwer Academic Publishers, Dordrecht 1
3. Hartnagel H.L., Dawar A.L., Jain A.K., and Jagadish C. Semiconducting Transparent Thin Films (1995), Institute of Physics Publishing, Bristol
4. Tippins H.H. Phys. Rev. 140 (1965) A316
5. Orita M., Ohta H., Hirano M., and Hosono H. Appl. Phys. Lett. 77 (2000) 4166
6. Harwig T., and Schoonman J. J. Solid State Chem. 23 (1978) 205
7. Freischer M., and Meixner H. Sens. Actuators B4 (1991) 437
8. Ogita M., Higo K., Nakanishi Y., and Hatanaka Y. Appl. Surf. Sci. 175/176 (2000) 721
9. Ohtani B. In: Puetz J., Kurtz A., and Aegerter M.A. (Eds). Proceedings of 5th International Conference on Coating on Glass, Saarbruecken, Germany (July 4-8 2004) 31
10. Kominami H., Murakami S.Y., Kera Y., and Ohtani B. In: Kaneko M., and Okura I. (Eds). Photocatalysis - Fundamentals and Applications (2002), Kodansha-Springer, Tokyo, Japan
11. Yu Z., Overgaard C.D., Droopad R., Passlack M., and Abrokwah J.K. Appl. Phys. Lett. 82 (2003) 2978
12. Villora E.G., Shimamura K., Kimura K., and Aoki K. Appl. Phys. Lett. 88 (2006) 031105
13. Battiston G.A., Gerbasi R., Porchia M., Bertoncello R., and Caccavale F. Thin Solid Films 279 (1996) 115
14. Orita M. Thin Solid Films 411 (2002) 134
15. Takeuchi T., Turkmen A., Ishikawa H., Okuda N., and Horikoshi Y. In: Ali N., Gracio J., and Jackson M.J. (Eds). Proceedings of International Conference on Surfaces, Coatings and Nanostructured Materials, Aveiro PORTUGAL, September 7-9 (2005) 152
16. Geller S. J. Chem. Phys. 33 (1960) 676
17. Snjders P.C., Jeurgens L.P.H., and Sloof W.G. Surf. Sci. 496 (2002) 97
18. Takeda S., Suzuki S., Odaka H., and Hosono H. Thin Solid Films 392 (2001) 338
19. Thomas A.G., Flavell W.R., Mallick A.K., Kumarasinghe A.R., Tsoutsou D., Khan N., Chatwin C., Rayner S., Smith G.C., Stockbauer R.L., Warren S., Johal T.K., Patel S., Holland D., Taleb A., and Wiame F. Phys. Rev. B75 (2007) 035105
20. A. Romanyuk, P. Oelhafen, Thin Solid Films (to be published in 2007).
21. Schroeder T., Zegenhagen J., Magg N., Immaraporn B., and Freund H.J. Surf. Sci. 552 (2004) 85