Electrical response to uniaxial tensile strain of a-Si:H TFTs fabricated on polyimide foils

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2627-2631

  Gleskova, Helena ^a   Wagner, Sigurd ^a  

^a Princeton University   (United States)

Author keywords

Mechanical properties; Silicon; Thin film transistors

Indexed keywords

ELECTRON MOBILITY; FAILURE ANALYSIS; SILICON COMPOUNDS; TENSILE STRAIN; THIN FILM TRANSISTORS;

ELECTRICAL FAILURE; ELECTROMECHANICAL RESPONSE; FAILURE STRAIN; TRANSFER CHARACTERISTICS;

POLYIMIDES;

EID: 42549173682     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.09.069     Document Type: Article

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