Ultrafast metal-insulator varistors based on tunable Al2 O3 tunnel junctions

Applied Physics Letters

Volumn 92, Issue 16, 2008, Pages

  Weimer, Michael A ^a   Hakim, Luis F ^a   King, David M ^a   Liang, Xinhua ^a   Weimer, Alan W ^a   George, Steven M ^a,b   Li, Peng ^c   Groner, Markus D ^d  

^a University of Colorado at Boulder   (United States)

^b UNIVERSITY OF COLORADO   (United States)

^c UNIVERSITY OF NEW MEXICO   (United States)

^d ALD NanoSolutions Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC LAYER DEPOSITION; TUNNEL JUNCTIONS; ULTRAFAST PHENOMENA;

AL2 O3 FILMS; METAL OXIDE VARISTORS; ULTRAFAST METAL-INSULATOR VARISTORS;

VARISTORS;

EID: 42549142095     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2913763     Document Type: Article

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