Formation of aldehyde- and carboxy-terminated self-assembled monolayers on SiO2 surfaces

Surface and Interface Analysis

Volumn 40, Issue 3-4, 2008, Pages 408-411

  Hozumi, Atsushi ^a   Taoda, Hiroshi ^a   Saito, Takao ^a   Shirahata, Naoto ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Aldehyde group; Carboxyl group; Chemical vapor deposition; Self assembled monolayer

Indexed keywords

ALDEHYDES; CHEMISORPTION; PHOTOOXIDATION; SILICA; ULTRAVIOLET RADIATION; WAVELENGTH; X RAY PHOTOELECTRON SPECTROSCOPY;

ALDEHYDE GROUPS; CARBOXYL GROUPS; RESIDUAL PRESSURE; TERMINAL GROUPS;

SELF ASSEMBLED MONOLAYERS;

EID: 42449132885     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2794     Document Type: Conference Paper

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