Submicrometer polymer transistors fabricated by a mask-free photolithographic self-alignment process

Applied Physics Letters

Volumn 92, Issue 15, 2008, Pages

  Bürgi, Lukas ^a   Pfeiffer, Reto ^a   Winnewisser, Carsten ^a  

^a CSEM   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; MICROFABRICATION; PHOTORESISTS; THICKNESS MEASUREMENT; THROUGHPUT;

PHOTORESIST THICKNESS; SELF-ALIGNMENT PROCESS; SUBMICROMETER CHANNELS; SUBMICROMETER POLYMER TRANSISTORS; THIN-FILM ELECTRODES;

THIN FILM TRANSISTORS;

EID: 42349101428     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2904969     Document Type: Article

References (17)

1. H. Kipphahn, Handbook of Print Media (Springer, Berlin, 2000).
2. Y. Mikami, Y. Nagae, Y. Mori, K. Kuwabara, T. Saito, H. Hayama, H. Asada, Y. Akimoto, M. Kobayashi, S. Okazaki, K. Asaka, H. Matsui, K. Nakamura, and E. Kaneko, IEEE Trans. Electron Devices 41, 306 (1994).
3. D. Zielke, A. C. Hübler, U. Hahn, N. Brandt, M. Bartzsch, U. Fügmann, T. Fischer, J. Veres, and S. Ogier, Appl. Phys. Lett. 87, 123508 (2005).
4. T. Mäkelä, S. Jussila, H. Kosonen, T. G. Bäcklund, H. G. O. Sandberg, and H. Stubb, Synth. Met. 153, 285 (2005).
5. U. Zschieschang, H. Klauk, M. Halik, G. Schmid, and C. Dehm, Adv. Mater. (Weinheim, Ger.) 15, 1147 (2003).
6. M. Leufgen, A. Lebib, T. Muck, U. Bass, V. Wagner, T. Borzenko, G. Schmidt, J. Geurts, and L. W. Molenkamp, Appl. Phys. Lett. 84, 1582 (2004).
7. J. Schellekens, D. Burdinski, M. Saalmink, M. Beenhakkers, G. Gelinck, and M. M. J. Decŕ, Nontraditional Approaches to Patterning, MRS. Symposia Proceedings Vol. EXS-2. (Materials Research Society, Pittsburg, 2004), p. 21-23.
8. C. W. Sele, T. von Werne, R. H. Friend, and H. Sirringhaus, Adv. Mater. (Weinheim, Ger.) 17, 997 (2005).
9. G. B. Blanchet, Y.-L. Loo, J. A. Rogers, F. Gao, and C. R. Fincher, Appl. Phys. Lett. 82, 463 (2003).
10. N. Stutzmann, R. H. Friend, and H. Sirringhaus, Science 299, 1881 (2003).
11. M. D. Austin and S. Y. Chou, Appl. Phys. Lett. 81, 4431 (2002).
12. Y.-L. Loo, R. L. Willett, K. W. Baldwin, and J. A. Rogers, Appl. Phys. Lett. 81, 562 (2002).
13. M. Ando, M. Kawasaki, S. Imazeki, H. Sasaki, and T. Kamata, Appl. Phys. Lett. 85, 1849 (2004).
14. A. Bonfiglio, F. Mameli, and O. Sanna, Appl. Phys. Lett. 82, 3550 (2003).
15. J. Z. Wang, Z. H. Zheng, H. W. Li, W. T. S. Huck, and H. Sirringhaus, Nat. Mater. 3, 171 (2004).
16. H. Oka, K. Nishiuchi, T. Nakamura, and H. Ishikawa, IEEE Trans. Electron Devices 27, 1514 (1980).
17. L. Bürgi, T. J. Richards, R. H. Friend, and H. Sirringhaus, J. Appl. Phys. 94, 6129 (2003).