Anatase-rutil TiO2 thin films deposited in a D.C. magnetron sputtering system

Romanian Reports of Physics

Volumn 53, Issue 1-2, 2008, Pages 217-221

  Stamate, M ^a   Lazar, G ^a   Lazar, I ^a  

^a VASILE ALECSANDRI UNIVERSITY OF BACAU   (Romania)

Author keywords

Anatase; D.c. magnetron; Electrical properties; Rutil; TiO2

Indexed keywords

EID: 42249104386     PISSN: 1221146X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. B. Karunagara, Kyunghae Kim, D. Mangalaraj, Junsin Yi, S. Velumani, Structural, optical and Raman scattering studies on DC magnetron sputtered titanium dioxide thin films, Solar Energy Materials& Cells, 88, 199-208, 2005.
2. 2 films epitaxially grown by reactive sputtering deposition, Solid State Electronics, 47, 2275-2278, 2003.
3. 2 films sputtered on unheated substrate, Surface and Coating Technology, 153, 93-99, 2002.
4. 2 films in modified rf magnetron sputtering, Surface and Coating Technology, 135, 286-290, 2001.
5. Diana Mardare, G. I. Rusu, Structural and electrical properties of TiO2 RF sputtered thin films, Materials Science and Engineering B, 75, 68-71, 2000.
6. Yoshie Ishikawa, Yasumichi Matsumoto, Electrodeposition of TiO2 photocatalyst into nanopores of hard alumite, Electrochimica Acta, 46, 2819-2824, 2001.
7. Cheol Ho Heo, Soon-Bo Lee, Jin-Hyo Boo, Deposition of TiO2 thin films using RF magnetron sputtering method and study of their surface characteristics, Thin Solid Films, 475, 183-188, (2005).
8. O. Fan, B. McQuillin, A. K. Ray, M. L. Turner, A. B. Seddon, High density, non-porous anatase titania thin films for device applications, J. Phys. D, Appl. Phys. 33, 2683-2686, 2000.
9. 2 films grown on conductive electrodes, Appl. Phys. Letters, 79 (17), 2797-2799, 2001.
10. 2 thin films deposited by a dc magnetron sputtering system, Thin Solid Films, 372, 246-249, 2000.
11. M. Stamate, On the non-linear I-V characteristics of dc magnetron sputtered TiO2 thin films, Appl. Surf. Sci, 205, 353-357, 2003.