On the non-linear I-V characteristics of dc magnetron sputtered TiO 2 thin films

Applied Surface Science

Volumn 205, Issue 1-4, 2002, Pages 353-357

  Stamate, Marius D ^a  

^a VASILE ALECSANDRI UNIVERSITY OF BACAU   (Romania)

Author keywords

dc electrical properties; Magnetron; Magnetron sputtering; Thin films; TiO 2; TiO 2 thin films

Indexed keywords

ALUMINUM; CURRENT VOLTAGE CHARACTERISTICS; GLASS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; TITANIUM DIOXIDE;

TRAP DENSITY;

THIN FILMS;

EID: 0037204376     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01130-3     Document Type: Article

References (9)

1. Bhuvanesh N.S.P., Gopalakrishnan J. J. Mater. Chem. 7:1997;2297.
2. Linsebigler A.L., Lu G., Yates J.T. Jr. Chem. Rev. 95:1995;735, and references therein.
3. Fujishima A., Honda K. Nature. 238:1972;37.
4. Kraeulter B., Bard A.J. J. Am. Chem. Soc. 100:1978;5985.
5. Rusu G.I. Appl. Surf. Sci. 65-66:1993;381.
6. Stamate M. Thin Solid Films. 372(1-2):2000;246.
7. Meng L.-J., Andritschky M., dos Santos M.P. Thin Solid Films. 223:1993;242.
8. Suhail M.H., Mohan Rao G., Mohan S. J. Appl. Phys. 71(3):1992;1421.
9. Tang H., Prasad K., Sanjines R., Schmid P.E., Levy F. J. Appl. Phys. 75(4):1994;2042.