A semi-automated AFM photomask repair process for manufacturing application using SPR6300

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Dellagiovanna, Mario ^a   Yoshioka, Hidenori ^a   Miyashita, Hiroyuki ^a   Murai, Shiaki ^b   Nakaue, Takuya ^c   Takaoka, Osamu ^c   Uemoto, Atsushi ^c   Kikuchi, Syuichi ^c   Hagiwara, Ryoji ^c   Benard, Stephane ^d  

^a DNP Photomask Europe SpA   (Italy)

^b DAI NIPPON PRINTING CO LTD   (Japan)

^c SII NANOTECHNOLOGY INC   (Japan)

^d Bs Technology eurl   (France)

Author keywords

Atomic force microscopy; Nanomachining; Photomask repair

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFECTS; NANOTECHNOLOGY; REPAIR; SEMICONDUCTOR DEVICE MANUFACTURE;

NANO-MANIPULATION; NANOMACHINING; PHOTOMASK REPAIR;

PHOTOMASKS;

DEFECTS; MASKING; SEMICONDUCTOR DEVICES;

EID: 42149189660     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746405     Document Type: Conference Paper

References (7)

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