Critical dimension measurement using new scanning mode and aligned carbon nanotube scanning probe microscope tip

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 B, 2006, Pages 1970-1973

  Yasutake, Masatoshi ^a   Watanabe, Kazutoshi ^a   Wakiyama, Sigeru ^a   Yamaoka, Takehiro ^a  

^a SII NANOTECHNOLOGY INC   (Japan)

Author keywords

Atomic force microscopy; Carbon nanotube; Critical dimension measurement

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; FUNCTIONS; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION MEASUREMENT; SCANNING MODE; SHALLOW TRENCH ISOLATION (STI);

PLASMA PROBES;

EID: 33645529373     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.1970     Document Type: Article

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