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Volumn 6703, Issue , 2007, Pages

Micro- and nanoprocessing of organic polymers using a compact laser plasma EUV source equipped with EUV optical systems

Author keywords

EUV; Microstructures; Photo etching

Indexed keywords

LASER ABLATION; LASER PRODUCED PLASMAS; MICROSTRUCTURE; OPTICAL SYSTEMS; PHOTONICS; ULTRAVIOLET RADIATION;

EID: 42149175607     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.735588     Document Type: Conference Paper
Times cited : (2)

References (12)
  • 2
    • 0035581058 scopus 로고    scopus 로고
    • The ablation of polymers under excimer laser irradiation: The physics of the process and the polymer structure, Nucl. Instr. and Meth. in
    • L.D.Laude, D.Martinez, Cl.Dicara, Fr.Hanus, K.Kolev, "The ablation of polymers under excimer laser irradiation: the physics of the process and the polymer structure", Nucl. Instr. and Meth. in. Phys. Res. B 185 (2001) 147
    • (2001) Phys. Res. B , vol.185 , pp. 147
    • Laude, L.D.1    Martinez, D.2    Dicara, C.3    Hanus, F.4    Kolev, K.5
  • 3
    • 27644552128 scopus 로고    scopus 로고
    • S. McGinty, G.M.O'Connor, T.J.Glynn, A comparative study of channel formation in polymer materials using VUV and UV nanosecond laser sources for use in micro-fluidic applications in Proc. SPIE 5825, Opto-Ireland 2005: Optoelectronics, Photonic Devices, and Optical Networks; Eds. John G. McInerney; Gerard Farrell; David M. Denieffe; Liam P. Barry; Harold S. Gamble; Padraig J. Hughes; Alan Moore (SPIE Press Bellingham, 2005) 622
    • S. McGinty, G.M.O'Connor, T.J.Glynn, "A comparative study of channel formation in polymer materials using VUV and UV nanosecond laser sources for use in micro-fluidic applications" in Proc. SPIE vol. 5825, Opto-Ireland 2005: Optoelectronics, Photonic Devices, and Optical Networks; Eds. John G. McInerney; Gerard Farrell; David M. Denieffe; Liam P. Barry; Harold S. Gamble; Padraig J. Hughes; Alan Moore (SPIE Press Bellingham, 2005) 622
  • 6
    • 0000951834 scopus 로고    scopus 로고
    • Enhanced X-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double nozzle setup
    • H. Fiedorowicz, A. Bartnik, R. Jarocki, R. Rakowski, M. Szczurek, "Enhanced X-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double nozzle setup" Applied Physics B 70 (2000) 305
    • (2000) Applied Physics B , vol.70 , pp. 305
    • Fiedorowicz, H.1    Bartnik, A.2    Jarocki, R.3    Rakowski, R.4    Szczurek, M.5
  • 9
    • 32844462204 scopus 로고    scopus 로고
    • A. Bartnik, H. Fiedorowicz, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, M. Szczurek, .,Strong temperature effect on x-ray photo-etching of polytetrafluoroethylene using a 10 Hz laser-plasma radiation source based on a gas puff target Applied Physics B 82 (2006) 529
    • A. Bartnik, H. Fiedorowicz, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, M. Szczurek, .,Strong temperature effect on x-ray photo-etching of polytetrafluoroethylene using a 10 Hz laser-plasma radiation source based on a gas puff target" Applied Physics B 82 (2006) 529
  • 10
    • 42149087738 scopus 로고    scopus 로고
    • H. Fiedorowicz, A. Bartnik, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, M. Szczurek, Micro- and nanoprocessing of organic polymers uising a laser plsma XUV source, in Proc. SPIE 6346, XVI International Symposium on Gas Flow, Chemical Laser, and High Power Lasers, Ed. D. Schuocker (SPIE Press Bellingham, 2006) 6341H-1
    • H. Fiedorowicz, A. Bartnik, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, M. Szczurek, "Micro- and nanoprocessing of organic polymers uising a laser plsma XUV source", in Proc. SPIE vol. 6346, XVI International Symposium on Gas Flow, Chemical Laser, and High Power Lasers, Ed. D. Schuocker (SPIE Press Bellingham, 2006) 6341H-1
  • 11
    • 42149162900 scopus 로고    scopus 로고
    • private communication
    • J. Heitz (private communication)
    • Heitz, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.