Fabrication of suspended dielectric mirror structures via xenon difluoride etching of an amorphous germanium sacrificial layer

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 2, 2008, Pages 593-597

  Cole, Garrett D ^a   Behymer, Elaine ^a   Goddard, Lynford L ^a,b   Bond, Tiziana C ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS GERMANIUM; DIELECTRIC MIRRORS;

AMORPHOUS MATERIALS; ETCHING; GERMANIUM; MIRRORS;

DIELECTRIC MATERIALS;

EID: 41649114000     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2890673     Document Type: Article

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