Elastic properties of several silicon nitride films

Materials Research Society Symposium Proceedings

Volumn 989, Issue , 2007, Pages 511-516

  Liu, Xiao ^a   Metcalf, Thomas H ^a   Wang, Qi ^b   Photiadis, Douglas M ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ELASTICITY; INTERNAL FRICTION; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE;

AMORPHOUS SOLIDS; ELASTIC PROPERTIES; HOT-WIRE CHEMICAL-VAPOR DEPOSITION;

THIN FILMS;

EID: 41549165786     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0989-a22-01     Document Type: Conference Paper

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