Hot-wire chemical vapor deposition epitaxy on polycrystalline silicon seeds on glass

Materials Research Society Symposium Proceedings

Volumn 989, Issue , 2007, Pages 133-137

  Teplin, Charles W ^a   Branz, Howard M ^a   Jones, Kim M ^a   Romero, Manuel J ^a   Stradins, Paul ^a   Gall, Stefan ^b  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; CRYSTALLIZATION; EPITAXIAL GROWTH; POLYCRYSTALLINE MATERIALS; SILICON;

EPITAXIALLY THICKENING; GLASS SUBSTRATES; HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

CHEMICAL VAPOR DEPOSITION;

EID: 41549090156     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0989-a06-16     Document Type: Conference Paper

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