Hot-wire CVD-grown epitaxial Si films on Si (100) substrates and a model of epitaxial breakdown

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 332-334

  Richardson, Christine E ^a   Mason, M S ^a   Atwater, Harry A ^a  

^a California Institute of Technology   (United States)

Author keywords

Hot wire vapor deposition; Low temperature epitaxial growth; Polycrystalline thin film Si

Indexed keywords

CHEMICAL VAPOR DEPOSITION; PHASE DIAGRAMS; SEMICONDUCTING FILMS; SUBSTRATES; WIRE;

HOT-WIRE VAPOR DEPOSITION; LOW-TEMPERATURE EPITAXIAL GROWTH; POLYCRYSTALLINE THIN FILM SI;

THIN FILMS;

EID: 32644443708     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.213     Document Type: Conference Paper

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