Thermal annealing of amorphous Ti-Si-O thin films

Journal of Materials Research

Volumn 23, Issue 3, 2008, Pages 755-759

  Hodroj, Abbas ^a   Chaix Pluchery, Odette ^a   Audier, Marc ^a   Gottlieb, Ulrich ^a   Deschanvres, Jean Luc ^a  

^a LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; RAMAN SCATTERING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS THIN FILMS; NANOGRAINS; PHASE SEGREGATION; THERMAL ANNEALING;

TITANIUM COMPOUNDS;

EID: 41449089484     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2008.0088     Document Type: Article

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