FTIR and XPS investigation of Er-doped SiO2-TiO2 films

Materials Science and Engineering: B

Volumn 105, Issue 1-3, 2003, Pages 209-213

  Fang, Q ^a   Meier, M ^b   Yu, J J ^a   Wang, Z M ^c   Zhang, J Y ^c   Wu, J X ^c   Kenyon, A ^a   Hoffmann, P ^b   Boyd, Ian W ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b EPFL   (Switzerland)

^c UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Er doped SiO2 TiO2 system; UV photo CVD; Wave guides

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELLIPSOMETRY; ERBIUM; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROSTRUCTURE; PHOTOCHEMICAL REACTIONS; PHOTOLUMINESCENCE; REFRACTIVE INDEX; THIN FILMS; TITANIUM DIOXIDE; ULTRAVIOLET RADIATION; WAVEGUIDES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

COVALENT BONDS;

SILICA;

EID: 0345307318     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.08.047     Document Type: Conference Paper

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