Growth of amorphous Ti-Si-O thin films by aerosol CVD process at atmospheric pressure

Journal of the Electrochemical Society

Volumn 155, Issue 2, 2008, Pages

  Hodroj, Abbas ^a   Deschanvres, Jean Luc ^a   Gottlieb, Ulrich ^a  

^a GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DEPOSITION RATES; FILM GROWTH; TERNARY SYSTEMS;

DEPOSITION CONDITIONS; DEPOSITION TEMPERATURES; TETRABUTOXYSILANE;

AMORPHOUS FILMS;

EID: 37549068122     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2806790     Document Type: Article

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