The deposition behavior of SiO2-TiO2 thin film by metalorganic chemical vapor deposition method

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2384-2388

  Lee, Si Moo ^a   Park, Jeong Hoon ^a   Hong, Kug Sun ^a   Cho, Woon Jo ^b   Kim, Dong Lae ^c  

^a Seoul National University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

^c Technical Institute of Glass Manufacture   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICA; TITANIUM DIOXIDE;

LORENTZ-LORENZ MODEL;

THIN FILMS;

EID: 0034272641     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (33)

1. W. J. Gunning, R. L. Hall, F. J. Woodberry, W. H. Southwell, and N. S. Gluck, Appl. Opt. 28, 2945 (1989).
2. H. Sankur and W. H. Southwell, Appl. Opt. 23, 2770 (1984).
3. M. F. Ouellette, R. V. Lang, K. L. Yan, R. W. Bertram, R. S. Owles, and D. Vincent, J. Vac. Sci. Technol. A 9, 1188 (1991).
4. R. Jacobson and J. O. Martensson, Appl. Opt. 5, 29 (1966).
5. M. Kobayashi and H. Terui, Appl. Opt. 22, 3121 (1983).
6. G. Boivin and D. St.-Germain, Appl. Opt. 26, 4209 (1987).
7. A. Feldman, E. N. Farabaugh, W. K. Haller, D. M. Sanders, and R. A. Stempniak, J. Vac. Sci. Technol. A 4, 2969 (1986).
8. H.-W. Zhang and S.-X. Liu, Thin Solid Films 209, 148 (1992).
9. A. G. Dirks and H. J. Leamy, Thin Solid Films 47, 219 (1977).
10. J.-S. Chen, S. Chao, J.-S. Kao, H. Niu, and C.-H. Chen, Appl. Opt. 35 ,90 (1996).
11. H. Sankur and W. Gunning, J. Appl. Phys. 66, 15 (1989).
12. H. Demiryont, Appl. Opt. 24, 2647 (1985).
13. T. Hanada, T. Aikawa, and N. Soga, J. Am. Ceram. Soc. 67, 52 (1984).
14. R. P. Netterfield, P. J. Martin, C. G. Pacey, and W. G. Sainty, J. Appl. Phys. 66, 1805 (1989).
15. H. Sankur and W. Gunning, J. Appl. Phys. 66, 4747 (1989).
16. X. Wang, H. Masumoto, Y. Someno, and T. Hirai, Thin Solid Films 338, 105 (1999).
17. N. Rausch and E. P. Burte, J. Electrochem. Soc. 140, 145 (1993).
18. Q. Zhang and G. L. Griffin, Thin Solid Films 263, 65 (1995).
19. D. S. Williams and E. A. Dein, J. Electrochem. Soc. 134, 657 (1987).
20. E. J. Kim and W. N. Gill, J. Electrochem. Soc. 142, 676 (1995).
21. S. B. Desu, J. Am. Ceram. Soc. 72, 1615 (1989).
22. A. C. Adams and C. D. Capio, J. Electrochem. Soc. 126, 1042 (1979).
23. C. P. Fictorie, J. F. Evans, and W. L. Gladfelter, 40th AVS National Symposium paper EM-TuP21, 1993.
24. M. F. Best and R. A. Condrate, J. Mater. Sci. Lett. 4, 994 (1985).
25. A. Chrnel, G. M. Eranosyan, and A. A. Kharchak, J. Non-Cryst. Solids 146, 213 (1992).
26. N. S. Gluck, H. Sankur, J. Heuer, J. Denatale, and W. J. Gunning, J. Appl. Phys. 69, 3037 (1991).
27. B. D. Fabes, D. P. Birnie III, and B. J. J. Zelinski, Thin Solid Films 254, 175 (1995).
28. S. Sivaram, Chemical Vapor Deposition (Van Nostrand Reinhold, New York).
29. M. G. M. Van der vis, E. H. P. Cordfunke, and R. J. M. Konings, J. Phys. IV 3, 75 (1993).
30. J. C. S. Chu, J. Breslin, N. S. Wang, and M. C. Lin, Mater. Lett. 12, 179 (1991).
31. F. C. Eversteijn, Philips Res. Rep. 21, 379 (1966).
32. R. J. Fessenden and J. S. Fessenden, Organic Chemistry, 4th ed. (Wadsworth, Belmont, CA, 1993).
33. C. J. Brinker and G. W. Scherer, Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processing (Academic, San Diego, CA, 1990).