Density, thickness and composition measurements of TiO 2 {single bond}SiO 2 thin films by coupling X-ray reflectometry, ellipsometry and electron probe microanalysis-X

Applied Surface Science

Volumn 253, Issue 1 SPEC. ISS., 2006, Pages 363-366

  Hodroj, A ^a   Roussel, H ^a   Crisci, A ^b   Robaut, F ^b   Gottlieb, U ^a   Deschanvres, J L ^a  

^a LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

^b Grenoble INP   (France)

Author keywords

Ellipsometry; EPMA; TiO 2 SiO 2; X ray reflectometry; XPS measurements

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; SILICA; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

CRITICAL ANGLE; KIESSIG FRINGES; PRECURSORS; X-RAY REFLECTOMETRY;

THIN FILMS;

EID: 33750518808     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.06.014     Document Type: Article

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