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Applied Surface Science

Volumn 207, Issue 1-4, 2003, Pages 139-143

Mechanism about improvement of NiSi thermal stability for Ni/Pt/Si(1 1 1) bi-layered system

(3) Wang, R N a Feng, J Y a Huang, Y a

a TSINGHUA UNIVERSITY (China)

Author keywords

NiSi; The solid solution; Thermal stability

Indexed keywords

ACTIVATION ENERGY; INTERFACIAL ENERGY; NICKEL COMPOUNDS; PLATINUM; RAPID THERMAL ANNEALING; SOLID SOLUTIONS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION;

BI-LAYERED SYSTEMS;

THIN FILMS;

EID: 0037470335 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(02)01327-2 Document Type: Article

Times cited : (13)

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