Investigation of Polycrystalline Nickel Suicide Films as a Gate Material

Journal of the Electrochemical Society

Volumn 148, Issue 5, 2001, Pages

  Qin, Ming ^a,b   Poon, Vincent M C ^a   Ho, Stephen C H ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^b SOUTHEAST UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000776924     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1362551     Document Type: Article

References (12)

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