Electrochemical corrosion behaviors of a-C:H and a-C:N X :H films

Applied Surface Science

Volumn 254, Issue 10, 2008, Pages 3021-3025

  Wang, Zhou ^a   Wang, Chengbing ^a   Wang, Qi ^b   Zhang, Junyan ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b LANZHOU UNIVERSITY   (China)

Author keywords

a C:H films; a C:N X :H films; CVD; Electrochemical corrosion

Indexed keywords

CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTROCHEMICAL CORROSION; POTENTIODYNAMIC POLARIZATION; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

A-C:H FILMS; A-C:NX:H FILMS; CARBON NITRIDE FILMS;

THIN FILMS;

EID: 39549123806     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.10.088     Document Type: Article

References (28)

1. Robertson J. Mater. Sci. Eng. R 37 (2002) 129
2. Camero M., Buijnsters J.G., Gómez-Aleixandre C., Gago R., Caretti I., and Jiménez I. J. Appl. Phys. 101 (2007) 63515
3. He L., Guo L.C., Guo X.J., Liu R.P., Tian Y.J., Wang H.T., and Guo C.X. Appl. Phys. Lett. 88 (2006) 101906
4. Sjöström H., Stafström S., Boman M., and Sundgren J.-E. Phys. Rev. Lett. 75 (1995) 1336
5. Yu K.M., Cohen M.L., Haller E.E., Hansen W.L., Liu A.Y., and Wu I.C. Phys. Rev. B 49 (1994) 5034
6. Li Y., Zhang Z.B., Xie S.S., and Yang G.Z. Chem. Phys. Lett. 247 (1995) 253
7. McCann R., Roy S.S., Papakonstantinou P., McLaughlin J.A., and Ray S.C. J. Appl. Phys. 97 (2005) 073522
8. Roy S.S., McCann R., Papakonstantinou P., Maguire P., and McLaughlin J.A. Thin Solid Films 482 (2005) 145
9. McCulloch D.G., and Merchant A.R. Thin Solid Films 290/291 (1996) 99
10. Yu G.-Q., Lee S.-H., and Lee J.-J. Diamond Relat. Mater. 11 (2002) 1633
11. Li H.X., Xu T., Chen J.M., Zhou H.D., and Liu H.W. Appl. Surf. Sci. 227 (2004) 364
12. Corbella C., Vives M., Oncins G., Canal C., Andujar J.L., and Bertrana E. Diamond Relat. Mater. 13 (2004) 1494
13. Zeng A., Liu E., Tan S.N., Zhang S., and Gao J. Electroanalysis 14 (2002) 18
14. Kim H., Ahn S., Kim J., Park S.J., and Lee K. Diamond Relat. Mater. 14 (2005) 35
15. Wang C.B., Yang S.R., Li H.X., and Zhang J.Y. J. Appl. Phys. 101 (2007) 013501
16. Ferrari A.C., and Robertson J. Phys. Rev. B 61 (2000) 14095
17. Casiraghi C., Ferrari A.C., and Robertson J. Phys. Rev. B 72 (2005) 085401
18. Dorner-Reisel A., Schürer C., Irmer G., and Müller E. Surf. Coat. Technol. 177/178 (2004) 830
19. Ferrari A.C., Rodil S.E., and Robertson J. Phys. Rev. B 67 (2003) 155306
20. Zhang Q., Yoon S.F., Ahn R.J., and Yang H. J. Appl. Phys. 84 (1998) 5538
21. Robertson J. Diamond Relat. Mater. 2 (1993) 984
22. Díaz J., Paolicelli G., Ferrer S., and Comin F. Phys. Rev. B 54 (1996) 8064
23. Singha A., Ghosh A., Roy A., and Ray N.R. J. Appl. Phys. 100 (2006) 044910
24. Sui J.H., and Cai W. Surf. Coat. Technol. 201 (2007) 6906
25. Liu D.P., Zhou J., and Fisher E.R. J. Appl. Phys. 101 (2007) 023304
26. Wu C.Z., Zhu X., Wang C.L., Sheng H., Yang J.L., and Xie Y. Appl. Phys. Lett. 90 (2007) 113116
27. Benlahsen M., Cachet H., Charvet S., Debiemme-Chouvy C., Deslouis C., Lagrini A., and Vivier V. Electrochem. Commun. 7 (2005) 496
28. Reisel G., Irmer G., Wielage B., and Dorner-Reisel A. Thin Solid films 515 (2006) 1038