SCOPUS 정보 검색 플랫폼

Diamond and Related Materials

Volumn 11, Issue 9, 2002, Pages 1633-1637

Effects of thermal annealing on amorphous carbon nitride films by r.f. PECVD

(3) Yu, Guo Qing a,b,c Lee, Seung Hoon a Lee, Jung Joong a

a Seoul National University (South Korea)

b INSTITUTE OF GEOLOGY AND GEOPHYSICS (China)

c NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

Carbon nitride; PECVD; Thermal annealing

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON NITRIDE; CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; RAPID THERMAL ANNEALING; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM THICKNESS;

AMORPHOUS FILMS;

CARBON NITRIDE;

EID: 0036721132 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(02)00111-5 Document Type: Article

Times cited : (38)

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