Enhanced hole injection and transport in molybdenum-dioxide-doped organic hole-transporting layers

Journal of Applied Physics

Volumn 103, Issue 3, 2008, Pages

  Matsushima, Toshinori ^a   Adachi, Chihaya ^a,b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ELECTROLUMINESCENCE; HOLE TRAPS; INFRARED ABSORPTION; ORGANIC LIGHT EMITTING DIODES (OLED); THIOPHENE;

ALPHA-SEXITHIOPHENE; ELECTRON TRANSPORTING LAYER; MOLYBDENUM DIOXIDE (MOO2);

MOLYBDENUM COMPOUNDS;

EID: 39349097098     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2836972     Document Type: Article

References (51)

1. S. R. Forrest, Nature (London) NATUAS 0028-0836 10.1038/nature02498 428, 911 (2004).
2. K. Okumoto, H. Kanno, Y. Hamada, H. Takahashi, and K. Shibata, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2266452 89, 063504 (2006).
3. H. Kanno, N. C. Giebink, Y. Sun, and S. R. Forrest, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2219725 89, 023503 (2006).
4. H. Kanno, Y. Hamada, K. Nishimura, K. Okumoto, N. Saito, H. Ishida, H. Takahashi, K. Shibata, and K. Mameno, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.45.9219 45, 9219 (2006).
5. D. Tanaka, H. Sasabe, Y. -J. Li, S. -J. Su, T. Takeda, and J. Kido, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 10.1143/JJAP.46.L10 46, L10 (2007).
6. G. He, M. Pfeiffer, K. Leo, M. Hofmann, J. Birnstock, R. Pudzich, and J. Salbeck, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1812378 85, 3911 (2004).
7. R. Meerheim, K. Walzer, M. Pfeiffer, and K. Leo, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2268354 89, 061111 (2006).
8. D. B. Romero, M. Schaer, L. Zuppiroli, B. Cesar, and B. Francois, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.115048 67, 1659 (1995).
9. F. Huang, A. G. MacDiarmid, and B. R. Hsieh, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.120078 71, 2415 (1997).
10. J. Blochwitz, M. Pfeiffer, T. Fritz, and K. Leo, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.121982 73, 729 (1998).
11. J. Kido and T. Matsumoto, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.122612 73, 2866 (1998).
12. A. Yamamori, C. Adachi, T. Koyama, and Y. Taniguchi, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.121304 72, 2147 (1998).
13. A. Yamamori, C. Adachi, T. Koyama, and Y. Taniguchi, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.371372 86, 4369 (1999).
14. V. -E. Choong, S. Shi, J. Curless, and F. So, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.125904 76, 958 (2000).
15. C. Ganzorig and M. Fujihara, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1331640 77, 4211 (2000).
16. X. Zhou, M. Pfeiffer, J. Blochwitz, A. Werner, A. Nollau, T. Fritz, and K. Leo, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1343849 78, 410 (2001).
17. X. Zhou, J. Blochwitz, M. Pfeiffer, A. Nollau, T. Fritz, and K. Leo, Adv. Funct. Mater. AFMDC6 1616-301X 10.1002/1616-3028(200108)11:4<310::AID- ADFM310>3.3.CO;2-4 11, 310 (2001).
18. A. Fukase and J. Kido, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 10.1143/JJAP.41.L334 41, L334 (2002).
19. J. Endo, T. Matsumoto, and J. Kido, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 10.1143/JJAP.41.L358 41, L358 (2002).
20. J. Huang, M. Pfeiffer, A. Werner, J. Blochwitz, K. Leo, and S. Liu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1432110 80, 139 (2002).
21. M. Pfeiffer, S. R. Forrest, K. Leo, and M. E. Thompson, Adv. Mater. 14, 1633 (2002). 0935-9648
22. J. Huang, J. Blochwitz-Nimoth, M. Pfeiffer, and K. Leo, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1533838 93, 838 (2003).
23. G. He, O. Schneider, D. Qin, X. Zhou, M. Pfeiffer, and K. Leo, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1702143 95, 5773 (2004).
24. T. Oyamada, H. Sasabe, C. Adachi, S. Murase, T. Tominaga, and C. Maeda, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1852707 86, 033503 (2005).
25. T. -Y. Cho, C. -L. Lin, and C. -C. Wu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2185077 88, 111106 (2006).
26. C. -L. Lin, T. -Y. Cho, C. -H. Chang, and C. -C. Wu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2178485 88, 081114 (2006).
27. C. -C. Chang, M. -T. Hsieh, J. -F. Chen, S. -W. Hwang, and C. H. Chen, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2405856 89, 253504 (2006).
28. H. Ikeda, J. Sakata, M. Hayakawa, T. Aoyama, T. Kawakami, K. Kamata, Y. Iwaki, S. Seo, Y. Noda, R. Nomura, and S. Yamazaki, 2006 Society for Information Display International Symposium, Digest of Technical Papers, San Francisco, CA, 2006, p. 923.
29. J. Guo, N. Koch, S. L. Bernasek, and J. Schwartz, Chem. Phys. Lett. 426, 370 (2006). 0009-2614
30. T. Matsushima and C. Adachi, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2410236 89, 253506 (2006).
31. D. -S. Leem, H. -D. Park, J. -W. Kang, J. -H. Lee, J. W. Kim, and J. -J. Kim, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2754635 91, 011113 (2007).
32. S. Watanabe, N. Ide, and J. Kido, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.46.1186 46, 1186 (2007).
33. M. Pfeiffer, A. Beyer, T. Fritz, and K. Leo, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.122718 73, 3202 (1998).
34. J. Blochwitz, T. Fritz, M. Pfeiffer, K. Leo, D. M. Alloway, P. A. Lee, and N. R. Armstrong, Org. Electron. OERLAU 1566-1199 10.1016/S1566-1199(01) 00016-7 2, 97 (2001).
35. J. Y. Lee and J. H. Kwon, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2172296 88, 183502 (2006).
36. S. Tokito, K. Noda, and Y. Taga, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/29/11/004 29, 2750 (1996).
37. K. J. Reynolds, J. A. Barker, N. C. Greenham, R. H. Friend, and G. L. Frey, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1522812 92, 7556 (2002).
38. G. L. Frey, K. J. Reynolds, and R. H. Friend, Adv. Mater. 14, 265 (2002). 0935-9648
39. T. Miyashita, S. Naka, H. Okada, and H. Onnagawa, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.44.3682 44, 3682 (2005).
40. H. Shimada, S. Naka, H. Okada, and H. Onnagawa, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.44.2830 44, 2830 (2005).
41. C. -W. Chu, S. -H. Li, C. -W. Chen, V. Shrotriya, and Y. Yang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2126140 87, 193508 (2005).
42. C. -W. Chen, Y. -J. Lu, C. -C. Wu, E. H.-E. Wu, C. -W. Chu, and Y. Yang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2141718 87, 241121 (2005).
43. V. Shrotriya, G. Li, Y. Yao, C. -W. Chu, and Y. Yang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2174093 88, 073508 (2006).
44. R. Satoh, S. Naka, M. Shibata, H. Okada, H. Onnagawa, T. Miyabayashi, and T. Inoue, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.45.1829 45, 1829 (2006).
45. H. You, Y. Dai, Z. Zhang, and D. Ma, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2430511 101, 026105 (2007).
46. Y. Kawamura, H. Sasabe, and C. Adachi, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.43.7729 43, 7729 (2004).
47. C. W. Tang, S. A. VanSlyke, and C. H. Chen, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.343409 65, 3610 (1989).
48. C. W. Tang and S. A. VanSlyke, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.98799 51, 913 (1987).
49. L. S. Hung, C. W. Tang, and M. G. Mason, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.118344 70, 152 (1997).
50. T. Hasegawa, S. Miura, T. Moriyama, T. Kimura, I. Takaya, Y. Osato, and H. Mizutani, 2004 Society for Information Display International Symposium, Digest of Technical Papers, Seattle, WA, 2004, p. 154.
51. V. G. Kozlov, V. Bulović, P. E. Burrows, and S. R. Forrest, Nature (London) NATUAS 0028-0836 10.1038/38693 389, 362 (1997).