Effective formation method for an aspherical microlens array based on an aperiodic moving mask during exposure

Applied Optics

Volumn 46, Issue 34, 2007, Pages 8346-8350

  Shi, Lifang ^a   Du, Chunlei ^a   Dong, Xiaochun ^a   Deng, Qiling ^a   Luo, Xiangang ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ASPHERICS; GERMANIUM; NONLINEAR OPTICS; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

FABRICATION RANGE; QUANTIZATION INTERVAL;

MICROLENSES;

EID: 39049114207     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.46.008346     Document Type: Article

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