Profile control technology for high-performance microlens array

Optical Engineering

Volumn 43, Issue 11, 2004, Pages 2595-2602

  Du, Chunlei ^a   Dong, Xiaochun ^a   Qiu, Chuankai ^a   Deng, Qiling ^a   Zhou, Chongxi ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

Aspherical microlens arrays; Exposure dose function; Exposure threshold; Moving mask lithography; Profile control

Indexed keywords

ASPHERICS; COMPUTER SIMULATION; EXPOSURE CONTROLS; MATHEMATICAL MODELS; MICROOPTICS; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; SEMICONDUCTOR LASERS;

ASPHERICAL MICROLENS ARRAY; EXPOSURE DOSE FUNCTION; EXPOSURE THRESHOLD; MOVING MASK LITHOGRAPHY; PROFILE CONTROL; REFRACTIVE MICROLENS ARRAY;

MICROLENSES;

EID: 11244328256     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1805563     Document Type: Article

References (20)

1. D. D'Amato and R. Centamore, "Two applications for microlens array: detector fill factor improvement and laser diode collimation," Proc. SPIE 1544, 166-177 (1991).
2. D. Kwo, G. Damas, and W. Zmek, "A Hartmann-Shack wavefront sensor using a binary optical lenslet array," Proc. SPIE 1544, 66-74 (1991).
3. J. R. Leger, M. L. Scott, P. Bundman, and M. P. Griswold, " Astigmatic wavefront correction of a gain-guided laser diode array using diffractive microlenses," Proc. SPIE 884, 82-89 (1988 ).
4. M. E. Motamedi, M. C. Wu, and K. S. J. Pister, "Micro-opto-electromechanical devices and on-chip optical processing," Opt. Eng. 36(5), 1282-1297 (1997).
5. R. Volkel, H. P. Herzig, P. Nussbaum et al., "Microlens array image system for photolithography," Opt. Eng. 35(11), 3323-3330 (1996).
6. M. T. Gale, M. Rossi, J. Pederson, and H. Schutz, "Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists," Opt. Eng. 33(11), 3556-3566 (1994).
7. Y. Fu and B. K. A. Ngoi, "Investigation of diffractive-refractive microlens array fabricated by focused ion beam technology," Opt. Eng. 40(4), 511-516 (2001).
8. L. Guo, B. Chen, L. Pang, C. Du et al., "Novel method for fabricating microlens array," Proc. SPIE 3099, 99-106 (1997).
9. J. M. Finlan, K. M. Flood, and R. J. Bojko, "Efficient f/1 binary-optics microlenses in fused silica designed using vector diffraction theory," Opt. Eng. 34(12), 3560-3564 (1995).
10. L. Hale, E. Motamedi, and W. Gunning, "Optical test and characterization of microlens arrays," Proc. SPIE 1544, 166-177 (1991).
11. M. B. Stern and T. R. Jay, "Dry etching for coherent refractive microlens arrays," Opt. Eng. 33(11), 3547-3551 (1994).
12. J. Jahns and S. J. Walker, "Two dimensional array of diffractive microlens fabrication by thin film deposition," Appl. Opt. 29 7), 931-936 (1990).
13. R. E. Kunz and M. Rossi, "Phase matched Fresnel elements," Opt. Commun. 97(12), 6-9 (1994).
14. D. Daly, R. F. Stevens, and M. C. Hutly, "Manufacture of microlenses by melting photoresist," Meas. Sci. Technol. 1, 323-326 (1998).
15. D. C. O'Shea and W. S. Rockward, "Gray-scale mask for diffractive-optics fabrication," Appl. Opt. 34(32), 7518-7526 (1995).
16. E.-B. Kley, F. Thoma, U. D. Zeitner et al., "Fabrication of micro optical surface profiles by using gray scale masks," Proc. SPIE 3276, 254-262 (1998).
17. C. Bo, G. Lurong, T. Jiyue, and T. Weijian, "Refractive microlens arrays with parabolic section profile and no dead area," Proc. SPIE 2866, 420-423 (1996).
18. C. Bo, G. Lurong, T. Jiyeu, and X. Ping, "Novel method for making parabolic grating," Proc. SPIE 2687, 142-149 (1996).
19. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron Devices 22(7), 445-452 (1975).
20. C. L. Henderson, S. N. Pancholi, S. A. Chowdhury, and C. G. Willson, "Photoresist characterization for lithography simulation part 2: exposure parameter measurements," Proc. SPIE 3049, 816-828 (1997).