Control approach for form accuracy of microlenses with continuous relief

Optics Express

Volumn 13, Issue 5, 2005, Pages 1353-1360

  Dong, Xiaochun ^a   Du, Chunlei ^a   Li, Shuhong ^a   Wang, Changtao ^a   Fu, Yongqi ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LITHOGRAPHY; MICROOPTICS; MICROSTRUCTURE; PHOTORESISTS;

DILL MODEL; MICRO-OPTIC ELEMENTS (MOE); MICRORELIEF STRUCTURE; PHOTOACTIVE COMPOUND CONCENTRATION (PAC);

MICROLENSES;

EID: 17444396404     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.001353     Document Type: Article

References (9)

1. M.,He, X. Yuan, and J. Bu, "Sample-inverted reflow technique for fabrication of a revolved-hyperboloid microlens array in hybrid solgel glass," Opt. Lett. 29, 2004-2006 (2004).
2. Y. Oppliger P. Sixt, J.M. Stauffer, J. M. Mayor, P. Regnault, and G. Voirin, "One-step 3D shaping using a gray-tone mask for optical and microelectronic applications," Microelectron. Eng. 23, 449-454 (1994).
3. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw. "Characterization of positive photoresist," IEEE Trans. Electron Devices 22, 445-452 (1975).
4. C. A. Mack, M. J. Maslow, A. Sekiguchi, and R. A. Carpio, "New model for the effect of developer temperature on photoresist dissolution," in Advances in Resist Technology and Processing XV, W. Conley, ed., Proc. SPIE 3333, 1218-1231 (1998).
5. G. G. Arthur, C. Wallace, and B. Martin, "Comparison of recent development models in optical lithography simulation," in Metrology, Inspection, and Process Control for Microlithography XII, B. Singh, ed., Proc. SPIE 3332, 538-549 (1998).
6. C. A. Mack and G. Arthur, "Notch model for photoresist dissolution," Electrochem Solid-State Lett. 1, 86-88 (1998).
7. C. L. Henderson, S. Pancholi, S. A. Chowdhury, C. G. Wilson, and R. R. Dammel, "Photoresist characterization for lithography simulation: II. Exposure parameter measurements," in Advances in Resist Technology and Processing XIV, R. G. Tarascon-Auriol, ed., Proc. SPIE 3049, 816-828 (1997).
8. C. L. Henderson, P. C. Tsiartas, S. Pancholi, S. A. Chowdhury, K. D. Dombrowski, C. G. Wilson, and R. R. Dammel, "Photoresist characterization for lithography simulation: III. Development parameter measurements," in Advances in Resist Technology and Processing XIV, R. G. Tarascon-Auriol, ed., Proc. SPIE 3049, 805-815 (1997).
9. C. Du, X. Dong, C. Qiu, Q. Deng, and C. Zhou, "Profile control technology for high performance microlens array," Opt. Eng. 43, 2595-2602 (2004).