Micro- and nanostructures inside sapphire by fs-laser irradiation and selective etching

Optics Express

Volumn 16, Issue 3, 2008, Pages 1517-1522

  Wortmann, Dirk ^a   Gottmann, Jens ^a   Brandt, Nelli ^a   Horn Solle, Herbert ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; NANOSTRUCTURED MATERIALS; OPTICAL DEVICES; HYDROFLUORIC ACID; IRRADIATION; MICROFLUIDICS; NANOSTRUCTURES; SOLUTIONS;

FEATURE LENGTHS; HF ACID; SELECTIVE ETCHING; CHEMICAL ETCHING; ELLIPTICALS; FEMTOSECOND LASER IRRADIATION; FOCUSING CONDITIONS; FS LASER; MICRO AND NANOSTRUCTURES; MICRO-FABRICATION; SELF-ORGANIZED NANOSTRUCTURES;

LASER BEAM EFFECTS; SAPPHIRE;

ALUMINUM OXIDE; NANOMATERIAL;

ARTICLE; CHEMISTRY; LASER; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

ALUMINUM OXIDE; LASERS; MATERIALS TESTING; NANOSTRUCTURES; NANOTECHNOLOGY; SURFACE PROPERTIES;

EID: 39049094545     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.001517     Document Type: Article

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