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Volumn 92, Issue 5, 2008, Pages

Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing

Author keywords

[No Author keywords available]

Indexed keywords

FLAT PANEL DISPLAYS; NATURAL FREQUENCIES; PLASMA DENSITY;

EID: 38949184497     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2840997     Document Type: Article
Times cited : (16)

References (16)
  • 3
    • 3943055339 scopus 로고
    • PSTEEU 0963-0252 10.1088/0963-0252/1/2/006.
    • J. Hopwood, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/1/2/006 1, 109 (1992).
    • (1992) Plasma Sources Sci. Technol. , vol.1 , pp. 109
    • Hopwood, J.1
  • 12
    • 33646192954 scopus 로고    scopus 로고
    • APPLAB 0003-6951 10.1063/1.2188037.
    • K. N. Kim, M. S. Kim, and G. Y. Yeom, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2188037 88, 161503 (2006).
    • (2006) Appl. Phys. Lett. , vol.88 , pp. 161503
    • Kim, K.N.1    Kim, M.S.2    Yeom, G.Y.3
  • 14
    • 0030141638 scopus 로고    scopus 로고
    • JPAPBE 0022-3727 10.1088/0022-3727/29/5/017.
    • U. Kortshagen, N. Gibson, and J. E. Lawler, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/29/5/017 29, 1224 (1996).
    • (1996) J. Phys. D , vol.29 , pp. 1224
    • Kortshagen, U.1    Gibson, N.2    Lawler, J.E.3
  • 16
    • 38949193384 scopus 로고
    • Principles of Plasma Discharges and Materials Processing (Wiley, New York).
    • M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
    • (1994)
    • Lieberman, M.A.1    Lichtenberg, A.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.