Effective plasma confinement by applying multipolar magnetic fields in an internal linear inductively coupled plasma system

Applied Physics Letters

Volumn 88, Issue 16, 2006, Pages

  Kim, Kyong Nam ^a   Kim, Mi Suk ^a   Yeom, Geun Young ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; ETCHING; INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELDS; SUBSTRATES;

COMB-TYPE ANTENNAS; ETCH UNIFORMITY; HIGH-DENSITY PLASMAS; MULTI-POLAR MAGNETIC FIELDS;

PLASMA CONFINEMENT;

EID: 33646192954     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2188037     Document Type: Article

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