Soft photocurable nanoimprint lithography for compound semiconductor nanostructures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 1, 2008, Pages 156-158

  Meneou, K ^a   Cheng, K Y ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSE ARRAY; PATTERN TRANSFER; PHOTOCURABLE NANOIMPRINT LITHOGRAPHY;

ATOMIC FORCE MICROSCOPY; DRY ETCHING; NANOSTRUCTURES; OPTOELECTRONIC DEVICES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GALLIUM ARSENIDE; WET ETCHING;

NANOIMPRINT LITHOGRAPHY;

GALLIUM COMPOUNDS; LITHOGRAPHY;

EID: 38849197042     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2823035     Document Type: Article

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