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Volumn 69, Issue 2-3, 2008, Pages 648-652

Thermal properties of hydrogenated amorphous silicon prepared by high-density plasma chemical vapor deposition

Author keywords

A. Amorphous materials; A. Semiconductors; A. Thin films; B. Vapor deposition

Indexed keywords

HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAPID THERMAL ANNEALING; SEMICONDUCTOR MATERIALS; THIN FILMS;

FILM STRESS; HYDROGEN DESORPTION; THERMAL DESORPTION SPECTRA (TDS);

AMORPHOUS MATERIALS;

EID: 38749135833 PISSN: 00223697 EISSN: None Source Type: Journal
DOI: 10.1016/j.jpcs.2007.07.095 Document Type: Article

Times cited : (11)

References (15)

1
- 0027591211
- Nam K.-S., Song Y.-H., Beak J.-T., Kong H.-J., and Lee S.-S. Jpn. J. Appl. Phys. 32 (1993) 1908
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 1908
- Nam, K.-S.¹ Song, Y.-H.² Beak, J.-T.³ Kong, H.-J.⁴ Lee, S.-S.⁵

2
- 19944433710
- Orwa J.O., Shannon J.M., Gateru R.G., and Silva S.R.P. J. Appl. Phys. 97 (2005) 023519
- (2005) J. Appl. Phys. , vol.97 , pp. 023519
- Orwa, J.O.¹ Shannon, J.M.² Gateru, R.G.³ Silva, S.R.P.⁴

3
- 0033421048
- Kim H.Y., Choi J.B., and Lee J.Y. J. Vac. Sci. Technol. A 17 (1999) 3240
- (1999) J. Vac. Sci. Technol. , vol.A 17 , pp. 3240
- Kim, H.Y.¹ Choi, J.B.² Lee, J.Y.³

4
- 0042736020
- Biener J., Lutterloh C., Wicklein M., Dinger A., and Küppers J. J. Vac. Sci. Technol. A 21 (1999) 831
- (1999) J. Vac. Sci. Technol. , vol.A 21 , pp. 831
- Biener, J.¹ Lutterloh, C.² Wicklein, M.³ Dinger, A.⁴ Küppers, J.⁵

5
- 0030563411
- Davis E.A. J. Non-Cryst. Solids 198-200 (1996) 1
- (1996) J. Non-Cryst. Solids , vol.198-200 , pp. 1
- Davis, E.A.¹

6
- 84861237893
- Andujar J.L., Bertran E., Canillas A., Roch C., and Morenza J.L. J. Vac. Sci. Technol. A 9 (1991) 2216
- (1991) J. Vac. Sci. Technol. , vol.A 9 , pp. 2216
- Andujar, J.L.¹ Bertran, E.² Canillas, A.³ Roch, C.⁴ Morenza, J.L.⁵

7
- 0021424688
- Ross R.C., and Jaklik Jr. J. J. Appl. Phys. 55 (1984) 3785
- (1984) J. Appl. Phys. , vol.55 , pp. 3785
- Ross, R.C.¹ Jaklik Jr., J.²

8
- 0035978860
- Katiyar M., and Abelson J.R. Mater. Sci. Eng. A 304-306 (2001) 349
- (2001) Mater. Sci. Eng. , vol.A 304-306 , pp. 349
- Katiyar, M.¹ Abelson, J.R.²

9
- 0000805728
- Abelson J.R. Appl. Phys. A 56 (1993) 493
- (1993) Appl. Phys. A , vol.56 , pp. 493
- Abelson, J.R.¹

10
- 0000981416
- Doyle J.R., Doughty D.A., and Gallagher A. J. Appl. Phys. 68 (1990) 4375
- (1990) J. Appl. Phys. , vol.68 , pp. 4375
- Doyle, J.R.¹ Doughty, D.A.² Gallagher, A.³

11
- 0001841364
- Matsuda A., Nomoto K., Takeuchi Y., Suzuki A., Yuuki A., and Perrin J. Surf. Sci. 227 (1990) 50
- (1990) Surf. Sci. , vol.227 , pp. 50
- Matsuda, A.¹ Nomoto, K.² Takeuchi, Y.³ Suzuki, A.⁴ Yuuki, A.⁵ Perrin, J.⁶

12
- 0037019294
- Sriraman S., Agarwal S., Aydil E.S., and Maroudas D. Nature 418 (2002) 62
- (2002) Nature , vol.418 , pp. 62
- Sriraman, S.¹ Agarwal, S.² Aydil, E.S.³ Maroudas, D.⁴

13
- 0036577284
- Fujiwara H., Kondo M., and Matsuda A. Jpn. J. Appl. Phys. 41 (2002) 2821
- (2002) Jpn. J. Appl. Phys. , vol.41 , pp. 2821
- Fujiwara, H.¹ Kondo, M.² Matsuda, A.³

14
- 0000073841
- Stoney G.G. Proc. R. Soc. London, Ser. A 82 (1909) 172
- (1909) Proc. R. Soc. London, Ser. , vol.A 82 , pp. 172
- Stoney, G.G.¹

15
- 0001463894
- Wehrspohn R.B., Deane S.C., French I.D., Gale I., Hewett J., Powell M.J., and Robertson J. J. Appl. Phys. 87 (2000) 144
- (2000) J. Appl. Phys. , vol.87 , pp. 144
- Wehrspohn, R.B.¹ Deane, S.C.² French, I.D.³ Gale, I.⁴ Hewett, J.⁵ Powell, M.J.⁶ Robertson, J.⁷

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