Study of copper-doped SiO2 films prepared by co-sputtering of copper and SiO2

Journal of Physics and Chemistry of Solids

Volumn 69, Issue 2-3, 2008, Pages 523-526

  Wang, Chen Jui ^a   Jou, Shyankay ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

A. Nanostructures; A. Thin films; B. Vapor deposition; C. Photoelectron spectroscopy; C. X ray diffraction

Indexed keywords

ARGON; COPPER; SILICA; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DC-SPUTTERING; VOID CHANNELS;

COMPOSITE FILMS;

EID: 38749130087     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2007.07.035     Document Type: Article

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