Germanium nanoclusters in silica thin films

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 69, Issue , 2000, Pages 468-473

  Stoiber, M ^a,b   Schiestel, S ^a   Carosella, C A ^a   Stroud, R M ^a   Grabowski, K S ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ENERGY GAP; FILM GROWTH; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; REFRACTIVE INDEX; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON COMPOUNDS; SILICA; VAPOR DEPOSITION; VOLUME FRACTION;

ION BEAM ASSISTED DEPOSITION (IBAD); PHYSICAL VAPOR DEPOSITION (PVD);

SEMICONDUCTING FILMS;

EID: 0033887855     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00413-4     Document Type: Article

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