XPS characterization of thin ZrO2 and (ZrO2) x(Al2O3)1-x films deposited on silicon

Journal of Optoelectronics and Advanced Materials

Volumn 9, Issue 2, 2007, Pages 256-259

  Vitanov, P ^a   Tsanev, A ^b   Stefanov, P ^b   Harizanova, A ^a   Ivanova, T ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Bulgaria)

Author keywords

(ZrC)2(Al2O3) 1 x; Metal oxides; Thin films; XPS study; ZrO2

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMS; CHEMICAL BONDS; DEPOSITION; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA;

(ZRC)2(AL2O3)1-X; CARBON IMPURITIES; CHEMICAL BONDINGS; CHEMICAL SOLUTION DEPOSITION METHOD; METAL OXIDES; SILICON SUBSTRATES; XPS CHARACTERIZATION; ZRO2;

THIN FILMS;

EID: 38749127625     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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