Effect of hydrogen dilution on growth of silicon nanocrystals embedded in silicon nitride thin film by plasma-enhanced CVD

Plasma Science and Technology

Volumn 9, Issue 5, 2007, Pages 599-602

  Ding, Wenge ^a   Zhen, Lanfang ^a   Zhang, Jiangyong ^a   Li, Yachao ^a   Yu, Wei ^a   Fu, Guangsheng ^a  

^a HEBEI UNIVERSITY   (China)

Author keywords

Hydrogen dilution; Silicon nanocrystals; Silicon nitride film

Indexed keywords

AMORPHOUS SILICON; CRYSTAL GROWTH; DILUTION; ENERGY GAP; HYDROGEN; INTERFACES (MATERIALS); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE;

HYDROGEN DILUTION; SILICON NANOCRYSTALS; SILICON NITRIDE FILMS;

NANOCRYSTALS;

EID: 38549108614     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/9/5/18     Document Type: Article

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