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Volumn 5040 I, Issue , 2003, Pages 131-138

Analysis of imaging performance degradation

Author keywords

Birefringence; CD control; Flare; Wavefront aberration; Zernike polynomials

Indexed keywords

ABERRATIONS; BIREFRINGENCE; COMPUTER SIMULATION; EXCIMER LASERS; OPTICAL DESIGN; OPTICS; PHOTOLITHOGRAPHY; POLYNOMIALS; WAVEFRONTS;

EID: 0141722496     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485465     Document Type: Conference Paper
Times cited : (12)

References (8)
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    • Optical Microlithography XIII
    • C.Progler et al. Zernike Coefficients: Are they really enough?, SPIE Proc. Vol.4000, Optical Microlithography XIII (2000)
    • (2000) SPIE Proc. , vol.4000
    • Progler, C.1
  • 2
    • 58649108752 scopus 로고    scopus 로고
    • Optical lens specifications from the user's perspective
    • Optical Microlithography XI
    • C.Progler et al: Optical lens specifications from the user's perspective, SPIE Proc. Vol.3334, Optical Microlithography XI (1998)
    • (1998) SPIE Proc. , vol.3334
    • Progler, C.1
  • 3
    • 0036415503 scopus 로고    scopus 로고
    • High NA and low residual aberration projection lens for DUV scanner
    • Optical Microlithography XV
    • T.Matsuyama et al: High NA and low residual aberration projection lens for DUV scanner, SPIE Proc. Vol.4691, Optical Microlithography XV (2002)
    • (2002) SPIE Proc. , vol.4691
    • Matsuyama, T.1
  • 4
    • 0036414704 scopus 로고    scopus 로고
    • Impact of Zernike cross-term on linewidth control
    • Optical Microlithography XV
    • T.Nakashima et al: Impact of Zernike cross-term on linewidth control, SPIE Proc. Vol.4691, Optical Microlithography XV (2002)
    • (2002) SPIE Proc. , vol.4691
    • Nakashima, T.1
  • 5
    • 0035758507 scopus 로고    scopus 로고
    • Scattered light: The increasing problem for 193nm exposure tools and beyond
    • Optical Microlithography XIV
    • K.Lai et al: Scattered light: the increasing problem for 193nm exposure tools and beyond, SPIE Proc. Vol.4346, Optical Microlithography XIV (2001)
    • (2001) SPIE Proc. , vol.4346
    • Lai, K.1
  • 6
    • 18644369746 scopus 로고    scopus 로고
    • Analysis of flare and its impact on low-k1 KrF and ArF lithography
    • Optical Microlithography XV
    • B.L.Fontaine et al: Analysis of Flare and its Impact on Low-k1 KrF and ArF Lithography, SPIE Proc. Vol.4691, Optical Microlithography XV (2002)
    • (2002) SPIE Proc. , vol.4691
    • Fontaine, B.L.1
  • 7
    • 4243468326 scopus 로고    scopus 로고
    • Intrinsic birefringence in 157nm materials
    • J.H.Burnett et al: Intrinsic birefringence in 157nm materials, the 157 symposium by SEMATECH (2001)
    • (2001) 157 Symposium by SEMATECH
    • Burnett, J.H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.