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Volumn 5040 II, Issue , 2003, Pages 801-810

Improving lens performance through the most recent lens manufacturing process

Author keywords

ArF projection lens; Lens manufacturing; Metrology

Indexed keywords

ABERRATIONS; BIREFRINGENCE; COMPUTER SIMULATION; COMPUTER SOFTWARE; LIGHTING; LITHOGRAPHY; OPTICAL DESIGN;

EID: 0141610602     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485461     Document Type: Conference Paper
Times cited : (23)

References (5)
  • 1
    • 0036415503 scopus 로고    scopus 로고
    • High NA and low residual aberration projection lens for DUV scanner
    • T. Matsuyama et al., "High NA and low residual aberration projection lens for DUV scanner", SPIE Vol. 4691, 2002.
    • (2002) SPIE , vol.4691
    • Matsuyama, T.1
  • 2
    • 58649108752 scopus 로고    scopus 로고
    • Optical lens specifications from the user's perspective
    • C. Progler and D. Wheeler, "Optical lens specifications from the user's perspective", SPIE Vol. 3334, 1998.
    • (1998) SPIE , vol.3334
    • Progler, C.1    Wheeler, D.2
  • 3
    • 25044440403 scopus 로고
    • (Addison-Wesley, Reading, Mass.)
    • E. Hecht, Optics, 2nd ed, pp. 352-354 (Addison-Wesley, Reading, Mass. 1990).
    • (1990) Optics, 2nd Ed , pp. 352-354
    • Hecht, E.1
  • 4
    • 25044438241 scopus 로고
    • (Addison-Wesley, Reading, Mass.)
    • E. Hecht, Optics 2nd ed, pp. 385-386 (Addison-Wesley, Reading, Mass. 1990).
    • (1990) Optics 2nd Ed , pp. 385-386
    • Hecht, E.1
  • 5
    • 0010366993 scopus 로고
    • Compensator selection in the tolerancing of a microlithographic lens
    • D. Williamson, "Compensator selection in the tolerancing of a Microlithographic lens", SPIE Vol. 1049, 1989.
    • (1989) SPIE , vol.1049
    • Williamson, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.