Domain decomposition methods for simulation of printing and inspection of phase defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1492-1501

  Lam, Michael ^a   Adam, Kostas ^a   Neureuther, Andy ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Defect printability; Defect projector; Domain decomposition; Lithography; Phase defects

Indexed keywords

CALCULATIONS; COMPUTER SIMULATION; DEFECTS; GRAPHIC METHODS; IMAGING TECHNIQUES; LIGHT POLARIZATION; OPTICAL PROJECTORS; PRINTING;

DEFECT PRINTABILITY; DOMAIN DECOMPOSITION METHODS; PHASE DEFECTS; SPATIAL FREQUENCY ERRORS;

LITHOGRAPHY;

EID: 0141609989     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485485     Document Type: Conference Paper

References (4)

1. K. Adam, A.R. Neureuther, "Simplified Models for EDGE Transitions in Rigorous Mask Modeling", Proc. of the SPIE, vol. 4346, pp. 331-344, 2001.
2. K. Adam, A.R. Neureuther, "Methodology for Accurate and Rapid Simulation of Large Arbitrary 2D Layouts of Advanced Photomasks", Proc. of the SPIE, vol. 4562, 2001.
3. K. Adam, Domain Decomposition Methods for the Electromagnetic Simulation of Scattering from Three-Dimensional Structures with Applications in Lithography, Electronics Research Laboratory, University of California, Berkeley, 2001.
4. A.R. Neureuther and K. Zaki, "Numerical Solution of Electromagnetic Boundary Value Problems by Means of the Asymptotic Anticipation Method", Radio Sci., Vol.3, No.12, pp. 1158 - 1167, December 1968.