A Model-Based Methodology for Reducing OPC Output Pattern Complexity

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 238-245

  Melvin III, Lawrence S ^a   Rieger, Michael L ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Dissection; Model; OPC; Reticles; Segment

Indexed keywords

OPTICAL PROXIMITY CORRECTION (OPC); RETICLES;

COMPUTATIONAL METHODS; COMPUTER SIMULATION; CONSTRAINT THEORY; DATA REDUCTION; MASKS; MATHEMATICAL MODELS; PROCESS CONTROL; PRODUCT DESIGN;

LITHOGRAPHY;

EID: 1842475769     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. Lugg, Robert, Dan Beale, et. al., "Adaptive OPC with a Conformal Target Layout," BACUS 2002.
2. Melvin, Lawrence S., III, James P. Shiely, et.al., "A Methodology to Calculate Line-End Correction Feature Performance as a Function of Reticles Cost," SPIE 2003.
3. Rieger, Michael L., Jeffrey P. Mayhew, et. al., "OPC Strategies to Minimize Mask Cost and Writing Time," BACUS 2001.
4. Newman, Tom, Ira Finklestein et. al., "Raster Shaped Beam Pattern Generation for 70 nm Photomask Production," BACUS 2002.
5. Proteus OPC ® Synopsys OPC tool.