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Volumn 5256, Issue 2, 2003, Pages 973-984
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Using Location of Diffraction Orders to Predict Performance of Future Scanners
a
Sigma C
(United States)
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Author keywords
Aerial image; AltPSM; Fraunhofer diffraction; Lithography; Modeling
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Indexed keywords
DIFFRACTION;
DYNAMIC RANDOM ACCESS STORAGE;
IMAGE ANALYSIS;
INTEGRATED CIRCUITS;
LIGHTING;
SILICON WAFERS;
DIFFRACTION ORDERS;
PHOTOLITHOGRAPHY;
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EID: 1842422465
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.518040 Document Type: Conference Paper |
Times cited : (4)
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References (5)
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