A nanodamascene process for advanced single-electron transistor fabrication

IEEE Transactions on Nanotechnology

Volumn 7, Issue 1, 2008, Pages 68-73

  Dubuc, Christian ^a,b   Beauvais, Jacques ^a,b   Drouin, Dominique ^b  

^a IEEE

^b UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

Chemical mechanical polishing (CMF); Electron beam lithography (EBL); Nanodevice characterization; Single electron transistor (SET)

Indexed keywords

CHARACTERIZATION; CHEMICAL MECHANICAL POLISHING; COULOMB BLOCKADE; ELECTRON BEAM LITHOGRAPHY; ELECTRON TRANSITIONS;

OPERATIONAL MARGINS; SINGLE-ELECTRON TRANSISTOR (SET);

NANOWIRES;

EID: 38149077351     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2007.913430     Document Type: Article

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