Atomic layer deposition of magnetic thin films

Acta Physica Polonica A

Volumn 112, Issue 6, 2007, Pages 1271-1280

  Mantovan, R ^a   Georgieva, M ^a   Perego, M ^a   Lu, H L ^a   Cocco, S ^a   Zenkevich, A ^b   Scarel, G ^a   Fanciulli, M ^a  

^a INFM   (Italy)

^b NATIONAL RESEARCH NUCLEAR UNIVERSITY MEPHI   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ELECTRODES; MAGNETIC FILMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; TUNNEL JUNCTIONS;

FERROMAGNETIC ELECTRODES; FERROMAGNETIC LAYERS; SUPERCONDUCTING QUANTUM INTERFERENCE DEVICE MAGNETOMETERS;

THIN FILMS;

EID: 38149041977     PISSN: 05874246     EISSN: None     Source Type: Journal    
DOI: 10.12693/APhysPolA.112.1271     Document Type: Conference Paper

References (21)

1. S.S.R Parkin, C. Kaiser, A. Panchula, P.M. Rice, B. Hughes, M. Samat, S. Yang, Nature Mat. 3, 862 (2004).
2. S Yuasa, T. Nagahama, A. Fukushima, Y. Suzuki, K. Ando, Nature Mat. 3, 868 (2004).
3. M. Ritala, M. Leskelä, in: Handbook of Thin Film Materials, Vol. 1, Ed. H.S. Nalwa, Academic Press, New York 2002, p. 135.
4. B.S. Lim, A. Rahtu, R.G. Gordon, Nature Mat. 2, 749 (2003),
5. H. Kim, J. Vac. Sei. Technol. B 21, 2231 (2003).
6. P. Seneor, A. Fert, J.L. Maurice, F. Montaigne, F. Petroff, A. Vaurés, Appl. Phys. Lett. 74, 4017 (1999).
7. E. Dagotto, T. Hotta, A. Moreo, Phys. Rep. 344, 1 (2001).
8. Yu Lu, X.W. Li, G.O. Gong, Gang Xiao, A. Gupta, P. Lecoeur, J.Z. Sun, Y.Y. Wang, V.P. Dravid, Phys. Rev. B 54, R8357 (1996).
9. J.M. Coey, M. Viret, S. von Molnar, Adv. Phys. 48, 167 (1999).
10. A.M. Haghiri-Gosnet, J.P. Renard, J. Phys. D, Appl. Phys. 36, R127 (2003).
11. O. Nilsen, M. Lie, H. Fjellvag, A. Kjekshus, in: Rare Earth Oxide Thin Film: Growth, Characterization, and Applications, Eds. M. Fanciulli, G. Scarel, Springer Verlag, Heidelberg 2007.
12. M.E. Gross, K. Schnoes Kranz, D. Brasen, H. Luftman, J. Vac. Sci. Technol. B 6, 1548 (1988).
13. L. Zhou, P.E. Wigen, IEEE Trans. Magn. 29, 3052 (1993).
14. C. Dallera, F. Fracassi, L. Braicovich, G. Scarel, C. Wiemer, M. Fanciulli, G. Pavia, B.C.C. Cowie, Appl. Phys. Lett. 89, 183521 (2006).
15. S.D. Elliott, G. Scarel, C. Wiemer, M. Fanciulli, G. Pavia, Chem. Mater. 18, 3764 (2006).
16. G. Scarel, S. Spiga, C. Wiemer, G. Tallarida, S. Ferrari, M. Fanciulli, Mater. Sei. Engineer. B 109, 11 (2004).
17. M. Putkonen, T. Sajavaara, L. Niinistö, J. Mater. Chem. 10, 1857 (2000).
18. J.R. Jasperse, A. Kahan, J.N. Plendl, Phys. Rev. 146, 526 (1966).
19. C. Kwon, M.C. Robson, K.-C. Kim, J.Y. Gu, S.E. Lofland, S.M. Bhagat, Z. Trajanovic, M. Rajeswari, T. Venkatesan, A.R. Kratz, R.D. Gomez, R. Ramesh, J. Magn. Magn. Mater 172, 229 (1997).
20. M. Nieminen, M. Putkonen, L. Niinistö, Appl. Surf. Sci. 174, 155 (2001).
21. G. Scarel, A. Debernardi, D. Tsoutsou, S. Spiga, S.C. Capelli, L. Lamagna, S.N. Volkos, M. Alia, M. Fanciulli, unpublished.